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  • Orbic Field s02 -
    Archival Digital Print, Sizes: 8”x10” and 13”x19” Pigment Inks on cotton rag substrate or Light Jet digital photo prints. (Also available in larger custom sizes or NFT by special order) Date created: 2018 A still image from the Acevedo Electronic
  • Orbic Field s04 -
    Archival Digital Print, Sizes: 8”x10” and 13”x19” Pigment Inks on cotton rag substrate or Light Jet digital photo prints. (Also available larger custom sizes or NFT by special order) Date created: 2018 This is a still image from Acevedo’s Electronic
  • Orbic Field s05 -
    Archival Digital Print, Sizes: 8”x10” and 13”x19” Pigment Inks on cotton rag substrate or Light Jet digital photo prints. (Also available larger custom sizes or NFT by special order) Date created: 2018 This is a still image from Acevedo’s Electronic
  • Orbic Field s06 -
    Archival Digital Print, Sizes: 8”x10” and 13”x19” Pigment Inks on Cotton Rag substrate or Light Jet digital photo prints. (Also available larger custom sizes or NFT by special order) Date created: 2018 This is a still image from Acevedo’s Electronic
  • Paul, Christiane. Renderings of Digital Art Vectors: Digital Art of Our Time Leonardo 35, no. 5 (2002): 471-474 and 476-484.
  • Paul, Christiane. Time Capsule Intelligent Agent 2, no. 2 (1998): 4-13.
  • In the video Making of Eve Clone I, I looked back and represented the process of me creating Eve Clone and the evolution of her body in each period. From the original drafting of Eve Clone, which recorded my inspiration of drawings, to using
  • Born 1968 in Redondo Beach, California (USA); 1986-1987 studied at Marymount College, Palos Verdes, CA; 1987-1991 studied at the Art Center College of Design, Pasadena, CA. Aitken lives and works in Los Angeles (USA). Aitken belongs to a generation
  • Brown, Richard. Virtual Unreality and Dynamic Form: An Exploration of Space, Time and Energy. Leonardo 33, no. 1 (April 2000).
  • Sommerer, Christa and Laurent Mignonneau. A-Volve: A Real-time Interactive Environment In Siggraph´94 Visual Proceedings, edited by Siggraph, 172-173. New York: ACM, 1994.